Storage: Preserve in a well-closed container and keep in cool, dry place, avoid light.
Where to buy 4534-73-0 COA Download MSDS Download
1,2,3,4-Butanetetracarboxylicdianhydride (BDA) 4534-73-0 C8H6O6
Application of 1,2,3,4-Butanetetracarboxylicdianhydride (BDA) 4534-73-0 C8H6O6
1,2,3,4-Butanetetracarboxylicdianhydride is a white crystalline solid. It is stable at room temperature. It is less soluble in some solvents such as dimethyl sulfoxide and acetic acid.1,2,3,4-butanetetracarboxylicdianhydride is mainly used in the preparation of catalysts and intermediates in organic synthesis. It can be used to generate a number of functional compounds, including playing an important role in the preparation of polymers, pigments and fluorescent dyes.
Premium Electronic Chemical Polymer Monomer for Advanced Industries https://www.heynovachem.com/products/ #polymer#monomer#list
Heynova is a leading manufacturer of electronic chemicals in China. Our products are not only in high purity, but also promise batch consistency and process stability. We provide zero-defect chemical solutions from lab to fab.
Electronic Chemicals and Speciality Polymer Materials List
Polyimide Materials
Polyimide Monomer
Polyimide Resin
Polyimide Engineering... morePremium Electronic Chemical Polymer Monomer for Advanced Industries https://www.heynovachem.com/products/ #polymer#monomer#list
Heynova is a leading manufacturer of electronic chemicals in China. Our products are not only in high purity, but also promise batch consistency and process stability. We provide zero-defect chemical solutions from lab to fab.
Electronic Chemicals and Speciality Polymer Materials List
Polyimide Materials
Polyimide Monomer
Polyimide Resin
Polyimide Engineering Plastic Products
Polyimide (PI) is a kind of high-performance polymers with excellent high-temperature resistance, mechanical strength, dielectric properties and chemical stability, and is widely used in flexible displays, semiconductor packaging, aerospace, and 5G communications.
Photoresist Materials
Photoresist Monomer
Photoacid Generator (PAG)
Photosensitizer (PAC)
Photoinitiator
Photoresist Resin
Photoresist BARC
Photoresist Additive
Photoresist Solvent
Photoresist is a key material in the semiconductor manufacturing, display panel and PCB industries, and its performance directly affects the process accuracy and yield of chips. Photoresist monomer is the key raw material for the synthesis of photoresist resin.
OLED Materials
OLED Monomer
OLED Display Material is the core of the new generation of display technology, with the advantages of self-illumination, high contrast, flexible and bendable, widely used in high-end smart phones, TVs, wearable devices and other fields.
Lithium Battery Materials
Electrolyte Additives
Lithium Battery Materials is the core link of new energy industry chain, and its performance directly determines the energy density, cycle life and safety of the battery. Lithium battery additives are the key 'gene material' to improve battery performance.
3D Printing Materials
3D Printing Organic Resin
High-End Metal Powders
3D Printing Materials are the core of additive manufacturing technology, and their performance directly determines the strength, precision and functionality of printed parts. As the core material for light-curing (SLA/DLP/LCD) 3D printing, organic resins are being upgraded from rapid prototyping to end products.
Custom Sythesis
Our company has more than ten sets of advanced testing equipment, including Agilent brand ICPMS/MS (ICPMS8900), HPLC, GC, GC-MS, GPC, etc., which provide strong support for the company's product development.
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Why Choose Heynova Electronic Chemical Polymer Monomer?
Through the triple advantages of technological limit breakthrough + localized rapid response + in-depth collaborative development, we are able to build up the competitiveness of the whole chain from lab to mass production.
1. Ultra-high purity & low metal impurities
Single metal impurities<1ppb (ICP-MS detection), meet semiconductor grade requirements.
Organic impurities<10ppm (HPLC/GC-MS analysis), avoiding exposure side reactions.
Particle control ≤0.1μm (Liquid Particle Counter), reducing lithography defects.
2. Customized molecular structure design
Photoresist monomer: Fluorine/Silicon modification to improve etch resistance.
PI monomer: Introduction of alicyclic structure to achieve high transparency (CPI film transmittance >90%).
Patent coverage: Owns a number of core patents for monomer synthesis and purification.
3. Functionalization modification ability
Photosensitive group introduction: E.g. Diazinonaphthoquinone (DNQ), Photoacid generator (PAG) bonding monomers.
Cross-linking modulation: Adjust the photoresist development and dissolution rate by monomer ratio.
Out-gassing design: Reduce contamination during EUV exposure.
4. Supply chain security
Localized production: Shorten lead time to 4-6 weeks.
Technical non-disclosure agreement: Support customized structures to protect intellectual property.
Customer value: Ensure batch consistency and improve chip yield.
Quality Control and Testing Methods for
Electronic Chemical Polymer Monomer
Quality Control and Testing Methods for </br>Electronic Chemical Polymer Monomer
Through QC and technical inspection ensure high reliability and consistency of products, ultimately helping customers to improve performance and reduce costs.
Production and supply chain control
Clean production environment: Production workshop needs to meet Class 100~Class 10 clean room standards to prevent particle contamination.
Full traceability: Tracking from raw material to finished product batch number, recording all testing data (e.g. COA).
Packaging and Transportation: Use high purity inert materials (e.g. PTFE bottles, double sealed bags), anti-vibration and anti-static during transportation.
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